Summary:
Silicon-based field effect transistor (FET) devices are building blocks of silicon-based digital, analog, and hybrid electronics. Often made of a metal-oxide-silicon (MOS) type structure, these devices are interconnected to generate so-called "complementary" MOSFET circuits, known as CMOS transistor circuitry. CMOS enjoys the benefits of low power and high speed operation, and advancements in these two properties have primarily been achieved through reduction of the channel length, which is now well into the submicron range for commercial devices. However, CMOS technology is approaching certain fundamental limits that will prohibit further miniaturization, likely due to the complex material formulations used. To overcome these limits, researchers at The Ohio State University have developed a novel Tunneling Field Effect Transistor (TFET) that will allow for further device miniaturization, reduced power, and increased speed beyond what is possible with current CMOS technology, while still enabling the use of well-established CMOS manufacturing processes.
Potential Applications:
- High-performance computing
- Power-constrained military systems
- Handheld/miniature electronics
- Practically anywhere silicon-based electronics are used
Advantages:
- Extends CMOS, enabling a new generation of device topologies while allowing the use of current manufacturing processes
- Faster turn-on at lower voltages than competing TFET designs
- Steep sub-threshold slopes (below 60mV/decade)
- Less current leakage in the "off" state compared to competing TFET designs
- Higher current densities in the "on" state compared to competing TFET designs
